Picosun P-300 ALD

Plasma Etchers & PECVD
Model:
Picosun P-300 ALD for sale
Price:
Request Price Quote     ID#:  4082
Picture:
Picosun Sunale P-300 Atomic Layer Deposition (ALD) System
photo
Click an image to view full size.
Details:

PICOSUN P-300 ATOMIC LAYER DEPOSITION (ALD) SYSTEM consisting of:

- Model: SUNALE P-300 ALD
- Configured for 150mm Wafers
- Capable up to 200mm Wafers
- Touch Panel PC
- Vacuum Chamber: AISI 304 Stainless Steel Vessel with 10 NW40KF Connection Flanges with Viton Seals
- Reaction Chamber: RC-200 PicoBatch Chamber, Large Sized (316SS) with Metal Sealing Surface
- Alarm Systems: Picozone O3 Alarm Systems
- Substrate Loader: Pneumatic Chamber Lift Mechanism Operational from Touch Panel
- Wafer Handling: Faith Rapitran II Automatic Wafer Handling System
- Vacuum Line Accessories: Afterburner and Powder Trap
- Picozone O3 Delivery System
- Picogases Connection Source System for High Vapor Pressure Gaseous Precursors in a Ventilated Cabinet
- Large Picosolution Cooled Source Systems for 600 ml of high Vapor Pressure Liquid Precursors (for TMA & DI Water) in a Ventilated Cabinet
- Software: Multisource Software with Customization
- Vintage: 2010
- S/N: RO5100
- CE Marked

Condition:

As-Is / Where-Is


Delivery:

2-4 weeks

Price:
      ID#:  4082